摘要
研究了光致抗蚀剂乳化废水用硫酸和含钙辅助剂破乳分离出有机物沉淀的预处理工艺。确定了最合适的预处理工艺参数和流程 ;用 G C/ MS法分析了废水的组成和浓度 ,并探讨了有机物的去除机理。试验结果表明 ,p H值控制在 3,辅助剂 A的浓度为 30 0 m g/ L、静置时间为 6 0 m in时 ,是最合适的工艺条件 ,废水的 CO DCr值从 156 0 0 m g/ L下降到 354 2 m g/ L,CO DCr的去除率达77.4 % ,投加辅助剂后既提高了有机物的去除率 ,又改善了沉淀物的过滤性能 。
The pretreatment technology and organic removal mechanisms of the photoresist emulsified wastewater in the electronic industry were discussed. The organic compounds were separated with the sulfuric acid and additive. It brings something forward the adaptable treating condition and technological process. The composition of the organic compound was detected by GC/MS analysis in the source and after the pretreatment wastewater. The experimental results showed the removal rate of COD\-\{Cr\} reached 77.4% and the COD\-\{Cr\} of the wastewater took from 15 600 to 3 540 mg/L when pH was 3, the concentration of additive was 300 mg/L and stewing time was 60 min; The additive added not only improve the performance the organic deposition but also reduce the cost of the follow\|up treating technology.\;
出处
《环境污染与防治》
CAS
CSCD
北大核心
2002年第4期207-209,215,共4页
Environmental Pollution & Control
