摘要
为实现工程中对油膜厚度无损检测的目的,需要在钢表面制备A1N 压电薄膜,作为声发射接收元件.采用直流反应磁控溅射技术,利用A1 作为过渡基层,在不锛钢上沉积A1N 薄膜.研究了改变溅射功率、氮气流量比等工艺条件对A1N 薄膜生长的影响.利用X 射线衍射仪（XRD）和原子力显微镜（AFM）对薄膜取向性及表面质量做了表征.实验结果表明,溅射功率的增加有利于A1N 薄膜的择优取向生长,但过高的功率会影响薄膜表面的粗輕度;氮气流量比过低或过高都会影响A1N 的生长,应将其控制在3 0 % - 7 0 % 的范围为宜.
In order to realize the non-destructive measurement of oil-film thickness, AlN thin film needs to be deposited on steel asthe component for emitting and receiving ultrasound. This paper takes Al as the bufler layer and uses the reactive magnetron sputteringtechnology to deposit the AIN thin film on stainless steel, and studies the effect of sputtering power and N2 concentration on itsgrowth. The films are characterized by X -ra y Diffraction （ X R D ）. The surface morphology and roughness （ RMS） of the films are observedby Atomic Force Microscope （ A F M ）. The results reveal that the higher sputtering power is advantageous to the oriented AlNthin film deposition. but the excess sputtering power could result in its high surface roughness. The N2 concentration has an effect onthe crystallinity of AlN films. Its ratio of 30 to 70 percent is betler.
作者
郭思宁
马希直
GUO Sining MA Xizhi(College of Mechanical and Electrical Engineering, Nanjing University of Aeronauticsand Astronautics, Nanjing 210016, China)
出处
《机械制造与自动化》
2016年第5期5-7,12,共4页
Machine Building & Automation
基金
国家自然科学基金(51475229)
关键词
不锈钢
ALN薄膜
磁控溅射
stainless steel
AlN thin film s
magnetron sputtering
