摘要
本实验利用2kW微波等离子体化学气相沉积(CVD)设备,系统探究了不同形核密度和氢等离子体处理对CVD金刚石膜沉积的影响。利用扫描电镜、X射线衍射和Raman光谱对样品的形貌、结构和质量进行了表征,结果表明:形核密度越低,金刚石膜的晶粒尺寸越大,且随着时间的延长,较低形核密度和高形核密度下沉积的金刚石膜能分别获得<110>取向和<111>。当给予合适的生长环境,不同形核密度下沉积的金刚石膜均能获得较高的质量。因此,金刚石厚膜的沉积,可以考虑在低形核密度的环境下进行。另外,在相对较低的基片温度和腔体气压下进行氢等离子体处理,可以在保证金刚石膜表面CHx含量变化不大的情况下,充分减少金刚石膜表面或亚表面的非金刚石相,进一步地提高金刚石膜的质量。
The effects of nucleation diamond thin films were systematically density and hydrogen plasma treatment on the deposition of CVD researched in a 2.0 kW MPCVD apparatus. The results obtained from SEM, XRD and Raman spectra show that the decrease of the nucleation density is benefit to increase the crystal size. With the extended deposition time, preferred 〈111〉 and 〈110〉 orientation of CVD diamond films can be deposited with high and low nucleation density, respectively. When appropriate growth condition is given, high quality diamond films can be prepared no matter with high or low nucleation densi- ty. Therefore, it is feasible to deposit high quality diamond thick films with relative low nucleation densi- ty. Moreover, Hz plasma treatment at relative low substrate temperature and chamber pressure can further improve the quality by decreasing sp2 phases in surface and sub-surface of diamond film, when keep the CH~ content in the surface of diamond films change slightly.
出处
《真空电子技术》
2016年第3期35-39,共5页
Vacuum Electronics
基金
国家自然科学基金(No.11175137)
湖北省教育厅项目(Q20151517)
关键词
金刚石膜
形核密度
氢等离子体
微波等离子体
化学气相沉积
Diamond film, Nucleation density, Hydrogen plasma, Microwave plasma, Chemical vapor deposition
