摘要
硅微粉在水溶液中的损耗主要包括湿氧化及硅溶解过程,对其表面钝化处理可减少水对硅微粉的腐蚀。采用1%H2O2溶液对硅微粉钝化处理后其表面形成致密、光滑的钝化层,钝化表层的悬挂键Si-O-Si和Si-H有利于阻止水对硅微粉的湿氧化损耗。经钝化处理的硅微粉在水溶液中浸泡48h后损耗率少于1%,与未经钝化处理的硅微粉在相同条件下损耗率超过20%相比,表面钝化处理对减少硅粉湿氧化损耗能发挥有效作用。
Silion loss in aqueous solution mainly results from wet oxidation and dissolution. The Si surface was passivated to reduce the loss of silicon in water. A compact and smooth passivated layer was formed on the surface of silicon powder immersed in 1% H2O2 solution. There are higher concentrations of Si-O-Si and Si-H on the surface of the passivatied layer compared to the native oxide layer. Surface passivation treatment has a good effect on reducing loss of silicon, and the results show that the loss rate is less than 1% for passivated silicon dusts while it is more than 20% for unpassivated silicon dusts in water and at room temperature for 48 h.
出处
《化学世界》
CAS
CSCD
2015年第4期225-228,共4页
Chemical World
关键词
硅微粉
湿氧化
表面钝化
silicon powders
wet oxidation
surface passivation
