摘要
采用多靶反应磁控溅射技术制备一系列不同Ti含量的W-Ti—N复合膜。采用x射线衍射仪、扫描电镜、纳米压痕仪等检测方法对薄膜的微结构和力学性能进行表征。采用UMT-2功能摩擦试验机，在室温、大气环境、无润滑的条件下对w—Ti—N复合膜的摩擦性能进行评价，同时，探讨薄膜的致硬机理和摩擦机制。结果表明：Ti含量（原子分数，下同）为5％～23．48％时，薄膜硬度处于峰值区，硬度值最高可达39GPa，摩擦因数在0．4左右。当Ti含量高于23．48％时，硬度随着Ti含量增加而下降，摩擦因数随Ti含量的增加而升高。
W-Ti-N composite films with different titanium content were fabricated by reactive magne- tron sputtering technique. The microstructure and mechanical properties of films were characterized by XRD,SEM and CSM. Tribological performance of the films was tested on UMT-2 multifunctional tribometer in the condition of room temperature,atmosphere environment and without lubrication. At the same time, the mechanisms of hardness enhancement and friction were also discussed. The results show that, at titanium content （atom fraction） of 5%-23.48%, the hardness of the film is in the peak area,and the maximums hardness is up to 39GPa,friction coefficient is about 0.4. When the Ti con- tent is higher than 23.48%, the hardness decreases with increasing of the titanium content. In addi- tion, the friction coefficient increases.
出处
《材料工程》
EI
CAS
CSCD
北大核心
2014年第12期23-27,共5页
Journal of Materials Engineering
基金
国家自然科学基金资助项目(51074080)
江苏省自然科学基金资助项目(BK2008240)
关键词
磁控溅射
W—Ti—N复合膜
微结构
力学性能
摩擦性能
magnetron sputtering
W-Ti-N composite film
microstructure
mechanical property
tribo-logical property
