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痕量Cu(Ⅱ)离子EDI富集过程研究

Study on enrichment of Cu(Ⅱ) ions from dilute aqueous solutions using continuous electrodeionization
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摘要 采用EDI技术富集痕量重金属,以0.1 mg/L的Cu2+溶液为例,研究不同因素对富集过程的影响.结果表明:膜堆在一定条件下存在平衡缓冲区,此区域内具有自我调节能力,确定了最佳操作条件为操作电流190mA、淡水流量60 mL/min、浓水流量15 mL/min、极水流量15 mL/min;膜堆在此条件进行富集操作稳定性好、重现性高、富集效果显著. EDI technology was applied to the enrichment of trace heavy metals, based on the copper ion solution which concentration was 0.1 mg/L, the influence of different factors on enrichment process is researched. The results indicate that there is balance buffer of the stack under certain conditions in which has self-regulation ability. Furthermore, the optimum operating conditions parameters are determined. The results demonstrate that the operating current of EDI is 190 mA, feed flow rate is 60 mL/min, concentrated solution flow rate is 15 mL/min, electrode rinse flow rate is 15 ml/min. In this condition for enrichment of operational stability of the stack, high reproducibility and enrichment effect is remarkable.
出处 《天津工业大学学报》 CAS 北大核心 2014年第5期53-56,共4页 Journal of Tiangong University
基金 天津市自然科学基金重点项目(12JCZDJC28400)
关键词 重金属 富集 EDI 有效性 平衡缓冲区 痕量 heavy metal enrichment EDI effectiveness balance buffer dilute
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