期刊文献+

CH与聚变材料Be相互作用的分子动力学模拟

Molecular Dynamic Simulation of Interaction of CH and Fusion Material Be
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摘要 采用分子动力学方法模拟了不同能量的CH粒子与聚变材料Be的相互作用。根据托卡马克中的环境,入射粒子CH的模拟入射能量分别设定为低能量(1,5,10,25 eV)和高能量(50,100,150,200 eV),其中碳的沉积率随能量的增大逐渐增加,而氢的沉积率恰好相反。当CH粒子的入射能量为低能量时,Be样品表面形成一层碳氢膜;且其膜厚度越来越薄,并且形成一个厚度逐渐增加中间层;当入射能量为高能量时,样品中的Be原子溅射越来越大,入射粒子在样品中的入射深度越来越深,对样品的破坏越来越大,且会在样品中形成一个C反应层。 The interaction of CH and fusion material Be is studied by molecular dynamic method in this paper. According to the environment in the tokamak, the simulated incident energy of the incident particle are low energy ( 1,5,10, 25 eV) and high energy (50,100,150,200 eV), respectively, the deposition rate of carbon atoms increased with the incident energy gradually, while it is opposite for the hydrogen atoms. When the incident energy of CH is low, a layer of hydrocarbon film is formed on the surface of Be, and increasingly film becomes more and more thicker as a function of incident energy, meanwhile, the intermediate layer is formed with thickness increase. When incident energy of the incident particle is high, the sputtering of Be atom increase largely, the penetration depth of the incident particle get deeper in the sample, the sample is destructed by the incident particle increasingly, and forming a reaction layer in the sample.
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2014年第7期687-693,共7页 Chinese Journal of Vacuum Science and Technology
基金 国际热核聚变实验堆(ITER)计划专项(批准号:2013GB114003) 科技部863基金项目(合同号:2011AA050515) 自然科学基金(项目批准号:11275135)
关键词 分子动力学 化学键 反应层 中间层 溅射率 Molecular dynamics Chemical bond Conversion zone Interlayer Sputtering rate
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参考文献24

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