摘要
对加速器生产111In所用镉靶制备工艺进行了研究。通过研究电沉积过程中影响Cd靶质量及厚度的各种因素 ,确定了最佳工艺条件。所研制的镉靶厚度大于 5 7mg/cm2 ,表面光亮、致密。
The preparation of the cadmium target for producing 111 In by cyclotron using a method of electrodeposition is described. The optimal process is determined by the studies of parameters that effect the properties of the target and target thickness. A cadmium target with a thickness of more than 57 mg/cm 2 and a shiny and tight layer is obtained.
出处
《原子能科学技术》
EI
CAS
CSCD
2002年第4期406-408,共3页
Atomic Energy Science and Technology
