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采用壳层效应屏蔽长度Monte Carlo方法计算溅射产额 被引量:2

SPUTTERING YIELD CALCULATION BY MONTE CARLO SIMULATION WITH SCREENING LENGTH OF SHELL EFFECTS
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摘要 使用ACAT模拟程序计算了不同离子碰撞在单原子材料上的溅射产额 .采用山村等人提出的考虑壳层效应的理论屏蔽长度 ,原子间作用势用Moli啨re势 .并将计算结果与实验数据和山村等的经验公式进行了比较 . The sputtering yields due to various ion impacts on monatomic materials are calculated with the ACAT code.As the interatomic potential,Moliére potential is used in the simulation,and the theoretical screenging length is adopted which was advanced by Yamamura to include shell effects.The calculation results are consistent with experiment data and Yamamura's empirical sputtering formula.
出处 《计算物理》 CSCD 北大核心 2002年第4期290-292,共3页 Chinese Journal of Computational Physics
基金 国家留学基金回国科研资助费 (留金法 [1999] 5 0 0 3号 )资助项目
关键词 MONTECARLO模拟 溅射产额 壳层效应 屏蔽长度 原子间作势 数值计算 Monte Carlo simulation sputtering yield screening length with shell effects interatomic potential
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同被引文献23

  • 1王爱囡,胡继刚.用神经网络算法预测溅射镀膜时的溅射产额[J].合肥工业大学学报(自然科学版),2005,28(7):812-815. 被引量:1
  • 2韩庆书,杨德全.生物力学中片流的边界元分析[J].计算物理,1995,12(1):19-24. 被引量:1
  • 3杨德全,韩庆书.二维粘性流动的边界元方法[J].水动力学研究与进展(A辑),1995,10(1):20-27. 被引量:10
  • 4杨文茂,刘艳文,徐禄祥,冷永祥,黄楠.溅射沉积技术的发展及其现状[J].真空科学与技术学报,2005,25(3):204-210. 被引量:46
  • 5陈明,王君,陈长琦,刘珍.基于Sigmund理论的溅射产额计算及分析[J].真空,2007,44(2):44-47. 被引量:12
  • 6田民波,李正操.薄膜技术与薄膜材料[M].北京:清华大学出版社,2011,155-156.
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  • 8Kornich G V, Betz G, Zaporojtchenko V, et al. Molecular dynamics simulations of interactions of Ar and Xe ions with surface Cu clusters at low impact energies [ J ]. Nuclear In- struments and Methods in Physics Research B,2005,228: 41 -45.
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