摘要
研究了以非磁性（Ｎｉ０．８１Ｆｅ０．１９）０．６６ＣＲ０．３４薄膜作为过诞层的坡莫合金Ｎｉ０．８１Ｆｅ０．１９薄膜的磁电阻效应和饱和磁场，分析退火处理对样品饱和磁场的影响和经刻蚀后的磁电阻效应膜线的尺寸效应，并建立一个统计模型定性分析了其性能变化的机理，计算结果符合实验．
The anisotropic magnetoresistance (AMR) and saturation magnetic field of the Permalloy thin films (Ni0.81Fe0.19) sputtered on a nonmagnetic (Ni0.81Fe0.19)(0.66)Cr-0.34 buffer layer were measured. The AMR variations of the films after annealing and the size effect of the AMR stripes after etching were emphatically studied, and a qualitative analysis was proposed through a statistic model. The simulation results agree with the experiments.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
2002年第2期321-325,共5页
Journal of Inorganic Materials
基金
中国科学院基金(KJ951-Al-401)
国家自然科学基金(198990310)
