摘要
综述了近十几年来,在铝的点蚀行为方面的一些突破性成就,对铝的亚稳点蚀、稳定点蚀及点蚀化学机制等方面的研究进行了评述。详细论述了在对铝的亚稳点蚀的研究中从定性描述发展到定量研究所取得的重大进展。对如何通过研究铝的点蚀扩展动力学来预测点蚀扩展行为,同时对钝化膜的半导体性能、电子性能进行了概述。
Some distinguish achievements in study of pitting behavior of aluminum in the past decade are reviewed. Metastable pitting, stable pitting and pitting chemistry of aluminum is presented with focus on great progress from qualita-tive description to quantitative studies in metastable pitting. How to predict the pit growth behavior by introducing pit growth kinetics is summarized,and some properties of passive film, such as semi conductive and electronic properties, are also discussed.
出处
《宇航材料工艺》
CAS
CSCD
北大核心
2002年第2期21-24,共4页
Aerospace Materials & Technology
