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LiNbO_3薄膜的制备方法和应用前景 被引量:1

Preparations, Performances, Applications and Development Perspective of LiNbO_3 thin film
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摘要 对近年来有关LiNbO3 薄膜的制备方法、性能及应用前景作了综述。比较详细地阐述了LiNbO3薄膜的几种主要制备方法及其优缺点 ,分析了用这些方法制成的LiNbO3 薄膜的性能 ,简要地介绍了LiNbO3 薄膜的一些应用 ,展望了LiNbO3 In this paper the preparations, performances and application of the LiNbO\-3 thin films are reviewed. The performances of the LiNbO\-3 thin films are discussed in detail. The applications and the development perspective of the LiNbO\-3 thin film are introduced.
出处 《材料热处理学报》 EI CAS CSCD 北大核心 2002年第1期65-69,共5页 Transactions of Materials and Heat Treatment
基金 国家重点实验室访问教授基金 国家自然科学基金(50 0 72 0 2 3)
关键词 薄膜铌酸锂 制备 性能 发展前景 LiNbO\-3 thin film preparations performances applications development perspective
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参考文献31

  • 1徐国跃,郭新立,刘俊明.(001)SiO_2衬底上LiNbO_3光波导薄膜的制备[J].南京航空航天大学学报,1999,31(2):223-226. 被引量:4
  • 2Hu W S,Lin Z G,Guo X L,et al. Pulsed laser deposition of (001) texture LiNbO3 films on Al2O3/SiO2/Si substrate[J] .Applied Surface Science,1999,141(1-2): 197 ~ 200.
  • 3Shibata Y,et al. Strain mechanism of LiNbO3/sappire heterostructure grown by pulsed laser deposition[J] .Jpn J Appl,1997,36(12A) :7344 - 7347.
  • 4Kawagnchi T, Yoon D H, Minakata M, et al. Fabrication of thin-film waveguide QPM-SHG device by domain-inverted liquid-phase exipaxy[ J ]. J Crys Grow,1998,191(1-2): 152 ~ 129.
  • 5Yamada A, Tanada H, Satioh M. Photorefractive damage in LiNbO3 thin films optical waveguides grown by liquid phase epitaxy[J]. J Appl, 1994,76;1776.
  • 6Kawaguchi T, Yoon D-H, Minakaka M,et al. Growth of high crystalline quality LiNbO3 thin films by a new liquid phase eptitaxial technique from a solidliquid coexisting melt [ J ]. J Crystal Growth, 1995,152: 87.
  • 7Lu D X, et al. Physical and optical properties of sputtered lithium niobate thin films[ A ]. Proceedings of SPIE-the international society for optical engineering [C], 1996,2897:361 ~368.
  • 8Park S K, Baek M S, Bac S C, et al. (012) orientation of LiNbO3 films fabricated by rf magnetron sputtering[J]. Ungyong Mulli, 1999,12(2):117 ~ 122.
  • 9Shimizu M, funshima Y, Nishida T, et al. Preparation and optical waveguide properties of LiNbO3 thin films by RF magnetron sputtering[ J ]. Jpn J Appl Phys,1993,32(9B) :4111 ~ 4114.
  • 10Sadashita Y, Segawa H. Preparation and characterization of LiNbO3 thin films produced by chemical-vapor deposition[J]. J Appl Phys, 1995,77( 11 ) :5995.

二级参考文献6

  • 1Yu T,Appl Phys Lett,1996年,69卷,2092页
  • 2Guo X L,J Phys D,1996年,29卷,1页
  • 3Liu Z G,Solid State Commun,1994年,91卷,671页
  • 4Liu J M,中国激光,1995年,22卷,5期,347页
  • 5薛增泉,薄膜物理,1991年,20页
  • 6黄孝瑛,透射电子显微学,1987年,131页

共引文献35

同被引文献32

  • 1陈强,肖定全,吴家刚,方瑜,王媛玉,袁小武,于光龙,熊学斌,朱建国.Pechini法制备铌酸锂陶瓷的结晶性能研究[J].功能材料,2004,35(4):477-479. 被引量:11
  • 2[1]MAKOTO T,KEIKO Y.Preparation and characterization of high-quality stoichiometric LiNbO3 thick films prepared by the sol-gel method[J].Thin Solid Films,2004,458:108-113.
  • 3[4]YUKIO S,HIDEO S.Preparation and characterization of LiNbO3 thin films produced by chemical-vapor deposition[J].Appl Phys,1995,77(11):5995-5999.
  • 4[5]YAMAGUCHI N.High-rate deposition of LiNbO3 fiims by thermal plasma spray CVD[J].Thin Solid Films,1998,316:185-188.
  • 5[6]SHIN-ICHI H.Growth of highly oriented LiNbO3 thin films through structure controlled metal alkoxide precursor solution[J].Journal of Crystal Growth,2002,237-239:2091-2097.
  • 6[7]PARK S K,BAEK M S.Properties of LiNbO3 thin film prepared from ceramic Li-Nb-K-O target[J].Solid State Communications,1999,111:347-352.
  • 7[8]KAEMMER K,FRANKE K.Preparation of textured liNbO3 thin films by off-axis laser deposition and their characterization[J].IEEE Ultrasonics Symposium,1996,1:243-246.
  • 8[10]TAKAHASHI M,YAMAUCHI K.Preparation and characterization of high-quality stoichiometric LiNbO3 thick films prepared by the sol-gel method[J].Thin Solid Films,2004,458:108-113.
  • 9[11]BORNAND V,HUET I,PAPET P.LiNbO3 thin films deposited on Si substrates:a morphological development study[J].Materials Chemis Physics,2002,77:571-577.
  • 10[12]KAZAWA H A,SHIMADA M.Correlation between interfacial structure and c-axis-orientation of LiNbO3 films grownon Si and SiO2 by electron cyclotron resonance plasma sputtering[J].Journal of Crystal Growth,2004,270:560-567.

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