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亚酞菁薄膜的折射率和吸收特性 被引量:7

Refractive Index and Absorption of a New Subphthalocyanine Thin Film
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摘要 通过真空镀膜法在单晶硅片上制备了一种新的亚酞菁 (三硝基溴硼亚酞菁 )薄膜。利用全自动椭圆偏振光谱仪研究了该薄膜的椭偏光谱 ,测量了其复折射率、复介电常数和吸收系数 ,估算了薄膜在窗口区域的俘获能级并对其吸收谱的成因作了分析。 A new subphthalocyanine (bromoboron trinitro-subphthalocyanine) thin film was prepared by vacuum deposition on a single-crystal silicon substrate. The ellipsometric spectra of this film have been investigated on an improved rotating analyzer-polarizer (RAP) type of scanning ellipsometer. The optical and dielectric constants, absorption coefficient and trapping levels of this film in the 400 nm-700 nm wavelength region were given. The spectra were explained and discussed as well.
出处 《光学学报》 EI CAS CSCD 北大核心 2001年第5期634-637,共4页 Acta Optica Sinica
基金 国家自然科学基金! (5 9832 0 6 0 )资助项目
关键词 椭偏光谱 折射率 吸收系数 真空镀膜 单晶硅 亚酞菁薄膜 复介电常数 Absorption Ellipsometry Optical properties Organic compounds Refractive index
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