摘要
本文研究了用直流电弧等离子体喷射法快速沉积的金刚石薄膜的生长特性,并与用热解CVD法沉积的金刚石薄膜生长特性做了比较。
The growth characteristics of diamond films deposited by DC arc plasma jet method were studied and compared with that of diamond films deposited by thermal CVD method.
出处
《吉林大学自然科学学报》
CAS
CSCD
1991年第3期67-69,共3页
Acta Scientiarum Naturalium Universitatis Jilinensis
关键词
快速沉积
金刚石
薄膜
生长
high-rate deposition, diamond films, growth characteristic
