摘要
分析了偶数点阵达曼光栅的设计原理与特性。利用数值优化方法 ,获得了一组 6 4× 6 4点阵达曼光栅解。光栅模版用电子束制版法制成 ,其最细线宽为 2 .5 μm。用光刻法实现了这一位相光栅 ,并比较了不同位相光栅制作法的优缺点。原子力显微镜测得的光栅深度曲线与 6 4× 6 4点阵实验结果表明 ,此光栅结果接近理论值。
The design method and features of even-numbered Dammann gratings are presented in this paper. With numerical optimization method, 64×64 Dammann grating solution is obtained. The mask pattern is fabricated with electro-beam facilities with the feature size of 2.5 μm. The phase grating is realized with photolithographic IC technique. Three different methods to realize phase gratings are discussed. The depth of binary-phase grating measured with an atomic force microscope and the measurements of the 64×64 spot array show that the experiment is in good agreement with the theoretical result.
出处
《中国激光》
EI
CAS
CSCD
北大核心
2001年第4期369-371,共3页
Chinese Journal of Lasers
基金
中国科学院百人计划
国家自然科学基金! (6 98370 2 0 )
上海市启明星计划! (98QD140 2 3)资助项目
关键词
达曼光栅
光互连
光刻法
设计
Dammann grating, optical interconnection, photolithography
