摘要
Al+Mg F2 膜是真空紫外波段常用的一种反射膜。根据薄膜光学的电磁场理论计算了正入射条件下 Al+Mg F2 膜在真空紫外波段的反射率随氟化镁膜厚度的变化规律。研究了 Al+Mg F2 膜的制备工艺 ,利用 Seya-Namioka紫外 -真空紫外反射率计测得 Al+Mg F2 膜的反射率在 1 50 nm～ 34 0 nm的波段上高于 80 %。Al+Mg F2 膜制备一年后 。
WT5BZ]MgF 2 overcoated aluminium films are often used in the spectral range of vacuum ultraviolet. According to the theory of electromagnetism, reflectance of Al+MgF 2 at normal incident was calculated in the way of matrix optics where the optical constant of MgF 2 was taken as a complex number. The effect of thickness of MgF 2 on the reflectance of Al+MgF 2 coatings was considered. The MgF 2 not only prevents the aluminum from being oxidized, but also increases the reflectance of Al+MgF 2 by interference. The reflectance of Al+MgF 2 at incident angle of 10° from 150nm^340nm is above 80% which was measured by Seya Namioka UV VUV reflectometer. The reflectance of Al+MgF 2 does not change distinctly after the aging of one year or keeping at the temperature of 55℃ for 12 h. The paper also discusses the preparation of Al+MgF 2 films. [WT5HZ]
出处
《光学精密工程》
EI
CAS
CSCD
2001年第2期165-168,共4页
Optics and Precision Engineering
关键词
反射膜
紫外
真空紫外
反射率
保护膜
coatings of Al+MgF_2
ultraviolet
vacuum ultraviolet
reflectivity
