摘要
针对光刻机界面现存的界面数据显示不一致、可靠性差、友好度低等问题,本文结合Model-View-Controller(MVC)模型及其关键技术设计出了操作快捷、响应事实、运行稳定的人机交互界面。结合ADAE(Adaptive Distribute Application Environment)平台和光刻机系统状态管理模型实现了人机交互界面的框架设计方案。
According to model and critical technology of Model-View-Controller （MVC）, the human-machine interactive interface possed characteristics of quick operation, response facts and stable running was designed, which solved several problems of lithography machine interface, such as inconsistent interface data show, poor reliability and low friendlines. Therefor, framework design plan of the human-machine interactive interface was realized utilizing platform of Adaptive Distribute Application Environment （ADAE） and management model of lithography machine＇s system state.
出处
《电子设计工程》
2014年第1期30-31,34,共3页
Electronic Design Engineering
关键词
光刻机
人机工程
MVC
人机界面
Optical lithography
human-machine engineering
MVC
human machine interaction
