摘要
采用射频磁控溅射法在Si(111)上制备出LaNiO3薄膜,并通过XRD、SEM等进行表征。结果表眀,LaNiO3薄膜在未退火状态下出现一定的择优取向,在空气中随着退火温度的增加,结晶性更好,出现钙钛矿型结构;900℃退火时出现杂相,LaNiO3发生分解导致薄膜表面形貌发生巨大变化。电阻率与结构中的氧空位有密切联系,退火温度增加,氧空位减少,电阻率减小。在700℃退火时可以得到1.59Ω·cm的最小电阻率。
LaNiO3 thin films were prepared on Si（111） with radio frequency magnetron sputtering （RFMS） method and characterized by XRD and SEM. The results show that a certain degree of preferred orientation appears in LaNiOa film under unannealed state. The higher the annealing temperature in air is, the better the film＇s crystallinity is, and perovskite type structure occurs. When the annealing temperature reaches 900 ℃, a hetero phase occurs, and the surface morphology changes dramatically due to decomposition of LaNiOa. The resistivity is closely linked with oxygen vacancies in the structure. The higher the annealing temperature is, the less the oxygen vacancies and the resistivity are. The minimum resistivity of 1.59 Ω · cm is obtained in film when annealed at 700 ℃.
出处
《有色金属（冶炼部分）》
CAS
北大核心
2013年第11期46-49,共4页
Nonferrous Metals（Extractive Metallurgy)
基金
国家自然科学基金资助项目(21063008)
