摘要
首先论述了 Si Ge技术的优势、发展历史和应用领域 ,并介绍了 Si Ge工艺和器件的进展 ,最后详细描述了 Si Ge
This paper clarifies the advantage,history and application field of SiGe technology,then introduces the advancement of SiGe technology and devices,finally gives a detailed description of the improvement of SiGe IC.
出处
《半导体情报》
2000年第6期8-14,20,共8页
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