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外部磁场对直流电弧等离子体放电特性的影响及其机理 被引量:17

Influence and Its Mechanism of External Magnetic Field on DC Arc Plasma Jet
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摘要 通过外部磁场驱动电弧旋转产生相对均匀的等离子体是一种可能的改进等离子体放电特性的有效手段。利用高速摄像技术和虚拟仪器技术,观察并测量了大气条件下、非均匀磁场驱动的直流电弧等离子体阳极弧根运动以及电弧电压波动。结果发现:相比无外部磁场,非均匀外部磁场驱动下的直流电弧等离子体在旋转力和稳弧力的作用下阳极弧根旋转,均匀性提高;其电弧电压波动幅度增大,放电模式发生改变;伏安特性曲线向上平移,电弧等离子体炬放电功率提高。另外,由于等离子体射流的高速运动而引起的等离子体射流在喷口处径向扩张,使等离子体射流横截面扩大,进一步提高了射流的均匀性。从结果中可以看出,外部磁场改善了直流电弧等离子体炬的基本特性,对直流电弧等离子体炬应用效率的提高具有重要的意义。 It is a promising measure to generate relatively uniform arc plasma by making the arc rotated through external magnetic field for improving the quality of plasma spraying.Using a high-speed video camera and virtual instrument technology,we measured the movement of anode arc root and the fluctuation of arc voltage of DC arc plasmas driven by non-uniform magnetic field under atmospheric pressure.The results show that,compared with the arc in the absence of external magnetic field,the arc root turns,the curve of the volt-ampere characteristic shifts up,and power of the DC arc plasma torch increases due to the rotational force and the stable arc force caused by the external magnetic field.In addition,since the plasma jet was expanded in radial direction at the nozzle due to high-speed movement,its cross section increased,and the homogeneity of plasma jet was increased.It is concluded that the external magnetic field can improve the basic characteristics of DC arc plasma torch,which is quite meaningful for further application of DC arc plasma.
出处 《高电压技术》 EI CAS CSCD 北大核心 2013年第7期1655-1660,共6页 High Voltage Engineering
基金 国家重点基础研究发展计划(973计划)(2008CB717800)~~
关键词 直流电弧等离子体炬 外部磁场驱动 旋转阳极弧根 电弧电压波动 伏安特性曲线 等离子体射流 DC arc plasma torch external magnetic field driving rotational arc root arc voltage fluctuation current-voltage curves plasma jet
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参考文献17

  • 1Vinayo M E, Kassabji F, Guyonnet J, et al. Plasma sprayed WC-Co coatings: Influence of spray conditions (atmospheric and low pressure spraying) on the crystal structure, porosity, and hardness[J]. Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 1985, 3(6): 2483-2489.
  • 2Pateyron B, Elchinger M F, Delluc G, et al. Thermodynamic and transport properties of Ar H2 and Ar He plasma gases used for spraying at atmospheric-pressure 1 : properties of the mix- tures[J]. Plasma Chemistry and Plasma Prosessing, 1992, 12 (4) : 421-448.
  • 3Spores R, Pfender E. Flow structure of a turbulent thermal plasma jet[J]. Surface and Coatings Technology, 1989, 37(3) : 250-271.
  • 4Takemura Y, Yamaguehi N, Hara T. Study on surface modification of polymer films by using atmospheric plasma jet source[J]. Japa nese Journal of Applied Physics, 2008, 47(7) : 6644-6647.
  • 5卢新培.等离子体射流及其医学应用[J].高电压技术,2011,37(6):1416-1425. 被引量:90
  • 6Slinkman D, Sacks R. Structure and dynamics of a magnetron DC arc plasma[J]. Applied Spectroscopy, 1990, 44(1) : 76-83.
  • 7Slinkman D, Sacks R. A magnetron DC arc plasma for aerosol analysis[J].Applied Spectroscopy, 1990, 44(1): 83-90.
  • 8Xia W D, Li L C, Zhao Y H, et al. Dynamics of large-scale magnetically rotating arc plasmas[J]. Applied Physics Letters, 2006, 88(21): 211501.
  • 9Yuen M C. Stability of the apaoiseuille plasma arc in an axial magnetic field[J]. Physics of Fluids, 1966, 9(6): 1140-1150.
  • 10Ragaller K, Kogelsch U, Schneide W R. Helix instability of a convection stabilizes high-current, high-pressure arc [J].Zeitschrift fur Naturforschung Section A Journal of Physical Sciences, 1973, 28(8): 1321-1328.

二级参考文献88

  • 1Yuan X Q, Li H, Zhao T Z, et al. 2005, Jpn. J. Appl. Phys., 43:7249
  • 2Wang H X, Chen X. 2005, Plasma Sci. and Technol., 7:3051
  • 3Ramachandran K, Marques J L, Vaben R, et al. 2006, J. Phys. D: Appl. Phys., 39:3323
  • 4Yu L. 1997, Modeling of D. C. Arc Plasma Torches and Jets. [Master Thesis]. Beijing: Tsinghua University
  • 5Han P. 1999, Numerical and Experimental Studies on the Characteristics of D.C. Arc Plasma Torches and Jets. [PhD Thesis]. Beijing: Tsinghua University
  • 6Li H P. 2001, Studies of Heat Transfer and Fluid Flow in a D.C. Arc Plasma Torch and Plasma Jet. [PhD Thesis]. Beijing: Tsinghua University
  • 7Li H P, Chen X. 2001, J. Phys. D: Appl. Phys., 34: L99
  • 8Li H P, Chen X. 2002, Chin. Phys., 11:44
  • 9Li H P, Pfender E, Chen X. 2003, J. Phys. D: Appl. Phys., 36:1084
  • 10Park J M, Kim K S, Hwang T H, et al. 2004, IEEE Trans. Plasma Sci., 32:479

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