摘要
含低浓度CrO_3(50～180~g/1)的镀铬液,镀液中加入含多稀土元素的CS添加剂,槽液工作温度为15～70℃,电流密度为4～60A/dm^2,经200多个厂点实践证明,分散能力比普通高铬镀液提高30～50%,电流效率提高60～110%.镀层硬度达850～1270HV,耐蚀性提高2～3级.
A novel Cr plating bath containing low concentration of CrO_3 (50～180g/1) with the addition of so-called CS additives comprising multiple kinds of rare earths was recommended. Electrodeposition was performed at 4～60A/dm^2 c. d. and at 15～70℃. Production practices in more than 200 installations showed that throwing power increased by 30～50% and current efficiency by 60～110% as compared with traditional Cr plating process, whereas corrosion resistance of the coating by NSS test was 2～3 grades higher and hardness was up to 850～1270 Hv.
出处
《电镀与涂饰》
CAS
CSCD
1991年第1期10-17,共8页
Electroplating & Finishing
