摘要
利用磁控溅射法在溅射功率分别为30,50,80,100W条件下制备ZAO薄膜,并通过原子力显微镜(AFM)、X射线衍射(XRD)谱对制得的薄膜样品进行表面形貌、结构特性和黏附性能进行研究。XRD结果表明,随着溅射功率的增加,ZAO薄膜呈现了明显的(002)择优取向,结晶质量获得提高。通过原子力显微镜对样品的二维、三维以及剖面线图进行分析。随着溅射功率增大,薄膜样品表面较均匀致密,晶粒生长较充分,结晶质量较高,粗糙度和黏附力均增大。
A1 doped ZnO transparent conductive oxide thin films were deposited by radio frequency magnetron sputtering technique with different sputtering powers. The surface morphology, structural characteristics and adhesion force of ZAO thin films were characterized by the atomic force microscopy（AFM） and X-ray diffraction （XRD）. The result shows that the strongest diffraction peaks of all samples were around in 20= 34.4°. The ZAO films exhibited the same preferential texture according to c （002） axis of ZnO hexagonal wurtzite structure perpendicular to the substrate surface. The two-dimensional images, three-dimensional images and profiles of the samples were analyzed by AFM. The results indicate that the quality of crys- tallization was improved gradually, the surface roughness and adhesion force of the films increased with the increasing of sputtering power.
出处
《北京石油化工学院学报》
2013年第2期17-21,共5页
Journal of Beijing Institute of Petrochemical Technology
基金
北京石油化工学院本科生研究计划资助项目
项目号:2011J00105
