期刊文献+

电子束蒸发制备碳化硼球面涂层的表面氧化研究

Research on the oxidation phenomenon of the boron carbide ball-coating deposited by electron beam evaporation
原文传递
导出
摘要 利用电子束蒸发技术沉积制备了碳化硼微球涂层,将微球涂层依次经退火和稀硫酸腐蚀处理后得到碳化硼空心微球,并借助XRD和SEM对碳化硼微球涂层的表面氧化问题进行了研究.XRD结果显示当衬底温度在120℃附近时,碳化硼涂层部分被晶化;对退火前后和酸腐蚀后的微球涂层进行SEM分析,结果表明,退火前的涂层表面部分被氧化成B2O3,退火后B2O3覆盖在涂层表面,酸腐蚀可以去掉B2O3,得到表面光洁的碳化硼空心微球. Boron carbide coatings were deposited on steel mandrels using electron beam evaporation at room temperature -120 ℃. Deposited coatings were annealed at 900℃ in high purity nitrogen for 1 h. The boron carbide micro-shells were obtained after drilling and corrosion by dilute sulfuric acid. The composition of the coating was analyzed by X-ray diffraction (XRD). The microstructure of the microshells were characterized by SEM. XRD pattern confirms that the as-deposited coating is composed of part crystallization boron carbide. SEM results show that the as-deposited coating was partially oxidated B2O3. After annealed, the coating surface was covered by the B2O3. Then, the smooth and clean boron carbide micro-shells surface was obtained after corrosion by sulfuric acid.
出处 《四川大学学报(自然科学版)》 CAS CSCD 北大核心 2013年第3期601-604,共4页 Journal of Sichuan University(Natural Science Edition)
基金 国家重大科技专项子课题
关键词 ICF靶 碳化硼涂层 电子束蒸发 氧化 显微结构 ICF target, boron carbide coating, electron beam evaporation, oxidation, microstructure
  • 相关文献

参考文献16

  • 1Ulrich S, Ehrhardt H, Schwan J, Samlenski R, et al, Subplantation effect in magnetron sputtered superhard boron carbide thin films [J]. Diamond and Related Materials, 1998, 7 (6): 835.
  • 2Thevenot F. Boron carbide-A comprehensive review[J]. Journal of the European Ceramic Society, 1990, 6 (4): 205.
  • 3Deng J X, Zhou J, Feng Y H, et al, Microstructure and mechanical properties of hot-pressed B4C/ (W, Ti)C ceramic composites [J]. Ceramics International, 2002, 28: 425.
  • 4Zhang H. Preparation of cross sections of thermal spray coatings or TEM investigation [J]. Journal of Thermal Spray Technology, 1992, 1 (1): 83.
  • 5Shin-ichi Aoqui, Hisatomo Miyata, Tamiko Ohshirna, et al. Preparation of boron carbide thin film by pulsed KrF excimer laser deposition process [J]. Thin Solid Films, 2002, 407: 126.
  • 6Lazzari R, Vast N, Besson J M, et al , Atomic structure and vibrational properties of icosahedral B4C boron carbide [J]. Phys Rev Lett. 1999, 83 (16): 3230.
  • 7Buzhinskij O I. Semenets Y M. Thick boron carbide coatings for protection of tokamak first wall and divertor [J]. Fusion Engineering and Design, 1999, 45, 343.
  • 8Burnham A K. Alford C S, Makowiecki D M, et al. Evaluation of B4C as an Ablator Material for NIF Capsules [J]. Fusion Technology, 1997,31(4): 456.
  • 9McElfresh M, Gunther 1, Alford C. et al. Fabrication of beryllium capsules with copper-doped layers for NIF targets, A progress report [J]. Fusion Science and Technology, 2006. 49 (4): 786.
  • 10Ronning C, Schwen D, Eyhusen S, et al. Ion beam synthesis of boron carbide thin films[J]. Surface and Coatings Technology. 2002, 158-159: 382.

二级参考文献37

共引文献16

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部