摘要
采用脉冲磁控溅射系统在玻璃衬底上制备了ZnO∶B薄膜,利用霍尔测试仪和紫外-可见光-近红外分光光度计及逐点无约束最优化法,研究了溅射气压(0.1～3 Pa)对ZnO薄膜的光学和电学特性的影响。结果表明:ZnO∶B薄膜在可见光区域内的平均透光率高于80%,近红外波段的透过率及薄膜的电阻率与溅射气压成正比;折射率n随溅射气压降低呈下降趋势,其值介于1.92～2.09之间;在较低的溅射气压下(PAr=0.1 Pa)获得的薄膜电阻率最小(3.7×10-3Ω.cm),且对应着小的光学带隙(Eg=3.463 eV)。
ZnO∶ B thin films were deposited on glass substrate by pulsed magnetron sputtering at room temperature.Hall measurement,UV-Vis-NIR spectrometer and the Pointwise unconstrained optimization method were employed to investigate the effects of sputtering pressure on optical and electrical properties of ZnO∶ B thin films.The results showed that the average optical transmittance of ZnO∶ B thin films was over 80% in visible spectral region,while near-infrared transmittance and resistivity of the film were proportional to the sputtering pressure.The refractive index n has a declined trend as the sputtering pressure decreases,with values of n ranging from 1.92 to 2.09.The lowest resistivity was obtained at sputtering pressure of 0.1 Pa,corresponding to the small optical bandgap(Eg=3.463 eV).
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2013年第5期833-836,共4页
Journal of Synthetic Crystals
基金
国家自然科学基金云南联合基金(U1037604)资助课题
关键词
磁控溅射
ZnO∶B薄膜
溅射气压
透过率
电阻率
折射率
magnetron sputtering
ZnO∶ B thin film
sputtering pressure
transmittance
resistivity
refractive index
