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硬质多孔聚氨酯脲抛光垫材料的制备及性能研究 被引量:2

Research on Preparation and Performance of Rigid Porous Polyurethane-Urea Polishing Pad Materials
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摘要 采用浇注机浇注的方法制备了可作为抛光垫材料使用的硬质多孔聚氨酯脲弹性体,借助万能拉力机、DMA、DSC等手段对材料性能进行表征。实验结果表明:调整硬段含量在一定范围时,可获得不同性能、多种抛光需求的抛光垫;与2,4–TDI相比,2,6–TDI的增加有助于与MOCA形成规整的硬段结晶,阻尼峰向高温处移动,但由于产物是完全线性结构,材料的储能模量反而有所降低;KEL值(能量损耗因子)用于表征材料的抛光性能时,少量的交联有助于获得较好的抛光效果。 The rigid porous polyurethane-urea elastomers used as polishing pad materials were prepared by casting method using casting machine, and their performance was characterized by means of universal tensile machine, DMA, DSC, and so on. The experimental results show that by adjusting hard segment content within a certain range, the polishing pads with different performance and meeting a variety of polishing needs can be obtained. Compared with 2,4-TDI, increase of 2,6-TDI is beneficial to form the regular rigid segment crystal with MOCA, the damping peak moves towards high temperature zone. Because the product is completely linear structure, the energe storage modulus of the materials decreases. When using the KEL value (energy loss factor) to characterize the polishing properties of the materials, small degree of cross-linking is beneficial to obtain better polishing effects.
出处 《化学推进剂与高分子材料》 CAS 2013年第3期77-80,92,共5页 Chemical Propellants & Polymeric Materials
关键词 化学机械抛光 力学性能 聚氨酯脲 chemical mechanical polishing mechanical property polyurethane-urea
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