摘要
本文讨论了ULSI的发展对低介电常数 (low k)介质的需求 ,介绍了几种有实用价值的low k介质的研究和发展现况 ,最后评述了low
In this Paper,the requirement of low k dielectric for developing ULSI is discussed.The current status of research and development for several promising and worthy low k dielectrics is introduced.Finally,the prospect on the application of low k dielectrics materials is reviewed.
出处
《电子学报》
EI
CAS
CSCD
北大核心
2000年第11期84-87,95,共5页
Acta Electronica Sinica
关键词
极大规模集成电路
低介电常数材料
无机介质
ULSI
low dielectric constant material
inorganic dielectric
organic polymer dielectric
