摘要
机械刻划法是制作平面光栅的重要方法之一。深入分析了机械刻划光栅的等间距刻线弯曲和刻线位置误差对平面光栅分辨本领和杂散光等光谱性能的影响,对改善光栅质量和提高应用水平有重要的意义。根据费马原理,建立了单色平行光入射、含有刻线弯曲和刻线位置误差的平面光栅在焦平面上成像的光线追迹数学模型,研究了上述两种刻线误差对光栅光谱性能的影响。结果表明,刻线弯曲和刻线位置误差分别主要影响光栅弧矢和子午方向光谱性能,刻线弯曲对光栅分辨本领和杂散光影响较小。据此对光栅刻划机刻划系统进行了修正。修正后的刻划系统产生的刻线位置误差的统计平均值降低至原有幅值的一半以下,从而有效抑制了光栅杂散光。
Machine-ruling method is one of the important methods for making plane grating. In order to improve the grating＇s performance and application level, it is particularly important to analysis the influence of ruling line＇s equal- distance curve and location error on plane grating performance, such as resolution, scattered light, etc. According to Fermat principle, a light-tracing mathematical model that simulates collimated monochromatic light incident on a plane grating which contains line＇s curved error, and location error and corresponding diffraction light imaged on the focal plane is established. The influence of above-mentioned grating line errors on grating performance is studied. Results show that grating line＇s curve and location error mainly influence grating sagittal and meridional spectral performance, separately, line＇s curved error has little effect on grating resolving power and scattered light. According to the analysis above, the ruling system of grating ruling machine is improved. Statistical average value of grating line＇s location error caused by modified ruling system is reduced to less than half of the original amplitude. Thereby grating scattered light is effectively suppressed.
出处
《中国激光》
EI
CAS
CSCD
北大核心
2013年第3期227-234,共8页
Chinese Journal of Lasers
基金
国家自然科学基金(60478034)
国家创新方法工作专项项目(2008IM040700)
国家重大科研装备研制项目(ZDY2008-1)
国家重大科学仪器设备开发专项项目(11YQ120023)
吉林省重大科技攻关项目(09ZDGG005)资助课题
关键词
光栅
平面光栅
光栅刻线弯曲
光栅刻线位置误差
衍射波前
光栅指标
grating plane grating grating line＇s curve grating line＇s location error
diffraction wavefronts grating specification
