摘要
为减小双工件台光刻机的换台时间,提出了一种改进5阶S轨迹和时间-冲击最小控制算法.分析了双驱双桥换台策略,曝光位和预对准位的两个工件台依次执行5个点对点运动完成换台过程.在常规数值积分S轨迹设计方法中,增加了减小冲击的优化项,设计了改进5阶S轨迹使加速度曲线更加平滑.以换台过程的时间-冲击最小为优化指标,为工件台系统设计了最优控制算法从而大幅度减小换台时间,并且克服了单纯以时间最优Bang-Bang控制中加速度突变的缺点.仿真和实验结果表明,利用轨迹规划和最优控制方法可以实现快速换台运动,改进5阶S轨迹加速度曲线最平滑,时间-冲击最优控制比5阶S轨迹具有更短的换台时间.
To reduce the exchange time of dual-stage lithography,a modified fifth-order S-curve planning method and a minimum-time and minimum-jerk control method are proposed.The dual-driver and dual-bridge exchange method of the wafer stages is analyzed,and the wafer stages on the exposure position and prealignment position make five point-to-point movements to complete the exchange process.A minimum-jerk optimization index is added to fifth-order S-curve based on numerical integration method,and a modified fifthorder S-curve planning algorithm is proposed to ensure the acceleration curve is smooth.Aiming at a minimumtime and minimum-jerk criterion,an optimal control system is designed to reduce the exchange time and overcome the default of controlling the acceleration mutation only by the minimum-time Bang-Bang control. Simulation and experiment results show that the exchange process can be realized by trajectory planning and optimal control method.The acceleration curve of modified fifth-order S-curve is the most smooth,and minimum-time and minimum-jerk optimal control system can achieve a shorter exchange time.
出处
《哈尔滨工业大学学报》
EI
CAS
CSCD
北大核心
2013年第3期7-13,共7页
Journal of Harbin Institute of Technology
基金
国家科技重大专项资助项目(2009ZX02207)
关键词
双工件台
时间-冲击最小
S轨迹
双驱双桥
dual-stage
minimum-time and minimum-jerk
S-curve
dual-driver and dual-bridge
