摘要
研制了一种工作在 1 5 5 0nm波长范围内的单模光纤微机械可调式光衰减器。该衰减器利用非硅表面微加工工艺 (这种工艺采用光致抗蚀剂和溅射铜薄膜作为牺牲层 ,电镀铁镍层作为结构层来制作MEMS元件 )制作 ,由电镀铁镍层构成的一个插在两对准光纤空隙中的挡光片 ,一个平面电感线圈 ,一个硅弹簧和二个带有V型槽的光纤对准元件构成。电镀铁镍制作的挡光片被固定在一个硅弹簧上 ,该挡光片采用非硅表面微加工工艺制作 ,平面电感线圈利用高深宽比的光刻工艺和掩蔽电镀工艺制作 ,硅弹簧和光纤对准元件采用反应离子刻蚀和硅的各向异性腐蚀工艺制作。
A single mode fiber micro electro mechanical systems(MEMS)variable optical attenuator operating in the 1550 nm wavelength region is described.The device is fabricated by nonsilicon surface micro machining,which uses the photoresist and the sputtered copper thin films as the scarificial layers,and the electroplated ferronickel as the structure layer to fabricate the optical MEMS components.The device consists of an electroplated ferronickel optical shutter interposed in a gap between two fiber alignment componets,an electroplated planar coil,a silicon spring,and two fiber alignment components with V?shaped grooves.The electroplated ferronickel shutter is suspended by a silicon spring The shutter is fabricated by the nonsilicon surface micromachining techniques.The planar coil is fabricated by high aspect ratio photolithography and mask plating processes.And the silicon spring and the fiber alignment components are fabricated by the reactive ion etching and by the silicon anisotropic etching process.
出处
《微细加工技术》
EI
2000年第4期56-59,共4页
Microfabrication Technology
关键词
微光机电系统
可调式光衰减器
微机械
电磁驱动
Micro optical electronic Mechanical systems
Variable Optical Attenuator
MEMS
Electromagnet moving
