摘要
研究了低温等离子体条件下ITO膜的沉积过程,获得了均匀、致密的ITO膜.测量了膜的光、电特性,确定了最佳沉积条件,并对实验结果进行了定性分析.
The deposition process of ITO films in low temperature plasma is studied.Uniform andcompact ITO films have been obtained.The optimum deposition conditions are established,and the experimental results are discussed qualitatively.
关键词
ITO膜
低温
等离子体
沉积
ITO films
Low temperature plasma
Reactive deposition
