摘要
电子束物理气相沉积是真空蒸发技术的一种,具有蒸发速率高和无污染的特点,目前广泛应用于材料表面涂层的制备。将离子束辅助和等离子辅助与电子束物理气相沉积技术相结合,可以提高蒸发粒子入射能量和扩散能力,改善由于电子束物理气相沉积工艺本身存在阴影效应和扩散能力低而引起的沉积材料的不致密等不足。介绍了电子束物理气相沉积技术的概况,并展望了该技术的未来应用及发展前景。
Electron beam physical vapor deposition is a vacuum evaporation technology, with a high evaporation rate and no pollution, now widely used in production of coatings. Ion beam assisted deposition and plasma assisted deposition can increase the particle incident energy and diffusion capacity, improve density of condensate. The current status of electron beam physical vapor deposition is reviewed. And the prospect of this technology is pointed out.
关键词
电子束物理气相沉积
离子束辅助沉积
等离子辅助沉积
electron beam physical vapor deposition, ion beam assisted deposition, plasma assisted deposition
