Electroluminescence Orientation in InGaN/GaN LED on Nano-patterned Sapphire by MOCVD
Electroluminescence Orientation in InGaN/GaN LED on Nano-patterned Sapphire by MOCVD
摘要
A 385 nm InGaN/GaN LED on the sapphire with the nano-pattem was fabricated and its electroluminescence property was investigated in a three-dimensional (3D) space. The experimental results showed that the luminescent intensity of the LED was obviously oriented based on the nano-pattem of the sapphire substrate. And the optical interference was used to explain the luminescence orientation of the LED on the nano-pattemed substrate.
A 385 nm InGaN/GaN LED on the sapphire with the nano-pattem was fabricated and its electroluminescence property was investigated in a three-dimensional (3D) space. The experimental results showed that the luminescent intensity of the LED was obviously oriented based on the nano-pattem of the sapphire substrate. And the optical interference was used to explain the luminescence orientation of the LED on the nano-pattemed substrate.
二级参考文献10
-
1刘敬伟,王刚,马丽,张凯亮,张丽蕾,王庆江,万丽芳.大尺寸液晶电视用LED背光源的设计与制作[J].液晶与显示,2006,21(5):539-544. 被引量:36
-
2冯道宁,王念春.地铁列车LED显示屏的设计[J].液晶与显示,2007,22(1):99-103. 被引量:10
-
3Lin Y C,Chang S J,Su Y K,et al.High power nitride based light emitting diodes with Ni/ITO p-type contacts[J].Solid-State Electron.,2003,47(9):1565-1568.
-
4Jiang H X,Jin S x,Li J,et al.ш-nitride blue microdisplays[J].Appl.Phys.Lett.,2001,78(9):1303-1305.
-
5Wierer J J,Steigerwald D A,Krames M R,et al.High-power AIGalnN flip-chip light-emitting diodes[J].Appl.Phys.Lett.,2001,78(22):3379-3381.
-
6Schnitzer I,Yablonovitch E,Caneau C,et al.30%external quantum efficiency from surface textured,thin-film light-emitting diodes[J].Appl.Phys.Lett.,1993,63(16):2174-2176.
-
7Craford M G,Stockman S A,Peanasky M J,et al.Semiconductors and Semimetals[M].New York:Academic Press,2000:132-135.
-
8Windisch R,Heremans P,Knobloch Kiesel A,et al.Light-emitting diodes with 31%external quantum efficiency by outcoupling of lateral waveguide modes[J].Appl.Phys.Lett.,1999,74(16):2256-2258.
-
9Cao X A,Zhang A P,Dang G T,et al.Schottky diode measurements of dry etch damage in n-and p-type GaN[J].,.Vac.Sci.Technol.A,2000,18(4):1144-1148.
-
10Pan Shyi-Ming,Tu Ru-Chin,Fan Yu-Mei,et al.Improvement of InGaN-GaN light-emitting diodes with surfacetextured indium-tin-oxide transparent ohmic contacts[J].IEEE Photonics Technology Letters,2003,15(5):649-651.
共引文献11
-
1田大垒,关荣锋,赵文卿,王杏.LED光取出技术研究进展[J].电子元件与材料,2008,27(4):42-44. 被引量:4
-
2徐丽华,邹德恕,邢艳辉,宋欣原,徐晨,沈光地.具有纳米级结构出光面的AlGaInP基发光二极管[J].光电子.激光,2008,19(10):1301-1303. 被引量:7
-
3邓琛,徐晨,徐丽华,邹德恕,蒋文静,戴天明,李晓波,沈光地.提高发光二极管出光效率的新方法[J].光电子.激光,2009,20(5):580-582. 被引量:6
-
4邓琛,徐晨,徐丽华,邹德恕,蒋文静,戴天明,李晓波,沈光地.高分子自组装掩膜的制备[J].高分子材料科学与工程,2010,26(1):151-154. 被引量:1
-
5冯异.GaN基发光二极管外量子效率研究进展[J].光机电信息,2010,27(1):23-28. 被引量:4
-
6于乃森,郭丽伟,彭铭征,朱学亮,王晶,贾海强,陈弘,周均铭.蓝宝石图形衬底上生长GaN的微区拉曼光谱研究(英文)[J].液晶与显示,2010,25(1):17-20.
-
7李夏南,于乃森,曹保胜,丛妍,周均铭.原位SiN_x掩膜生长GaN材料的应力及其对光学性质的影响(英文)[J].液晶与显示,2010,25(6):776-779. 被引量:3
-
8甄珍珍,杨瑞霞,王静辉.p-GaN与ITO欧姆接触的研究[J].半导体技术,2012,37(5):371-374.
-
9朱彦旭,邓琛,徐晨,邢艳辉.AlGaInP红光LED的GaP窗口层自组装法粗化[J].半导体技术,2012,37(9):698-701.
-
10孙少娇,牛萍娟,邢海英.ITO表面微元粗化对GaN基LED光效的改善[J].天津工业大学学报,2012,31(6):64-67.