摘要
利用Mass软件设计了TiO2/SiO2纳米多层光学增透膜膜系,并采用高真空电子束蒸发系统在不同O2分压条件下制备了TiO2/SiO2纳米多层膜,TiO2/SiO2薄膜多层膜体系在沉积条件下获得了很好的宽光谱光学透射性能,在可见光谱范围内透射率接近设计值,平均透射率达到90%以上。通过一系列测试方法对多层膜退火前后的透射率、组分结构和退火以后的残余应力以及表面形貌进行了研究。实验结果表明:在较高O2分压条件下,由于多层膜结构中O空位的减少,使得多层膜透射率逐渐增加。在退火条件下,随着退火温度的增加,导致了表面均方根粗糙度(RMS)的增加以及晶粒的聚集长大,500℃时多层膜组分结晶化明显加强,使得缺陷增多;同时受退火温度的影响,残余应力逐渐增加,组分相互扩散加剧使得多层膜界面受到破坏。这些因素最终导致TiO2/SiO2多层膜的透射率逐渐降低。
We model and optimize a configuration of six-layer anti-reflective （AR） TiO2/SiO2 coatings on K9 glass substrates by the Mass software. TiO2/SiO2 multilayers were deposited by electron beam evaporation with different O2 partial pressures. The results show that the higher transmissivity is produced at high O2 partial pressure because of less oxygen vacancies needed in multilayers. The crystallite has a tendency to congregate,causing the increase in surface roughness,and the transmittance of TiO2/SiO2 films is decreased. The influence of the annealing on microstrueture and properties of the TiO2/SiO2 multilayers is discussed and the dependence of their structural and optical properties on annealing temperature is explored. At 500 ℃,the mixed amorphous phase appears in the TiO2/SiO2 thin films. The decrease in transmittance of composite thin films with annealing temperature is related to the increased residual stress and damaged interface.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2012年第12期2355-2361,共7页
Journal of Optoelectronics·Laser
基金
天津师范大学实验室改革研究基金(B201107)资助项目
关键词
O2分压
TIO2
SiO2纳米多层光学增透膜
电子束蒸发
透射率
O2 partial pressure
TiO2/SiO2 nano-multilayer anti-reflective fAR） film
electron beam evaporation
transmittance
