期刊文献+

影响印制线路板电镀填盲孔效果的因素 被引量:16

Factors affecting blind via filling by electroplating in PCB manufacturing
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摘要 讲述了印制线路板电镀填盲孔带闪镀和不闪镀的工艺流程及其对设备的要求,讨论了影响电镀填盲孔效果的因素,包括设备设计、电镀参数、板材、孔型、镀液组成等。 The process flows with and without flash plating for blind via filling of printed circuit board and related equipment requirements were introduced. The factors affecting blind via filling were discussed, such as equipment design, electroplating parameters, board material, via configuration, and bath comoosition.
出处 《电镀与涂饰》 CAS CSCD 北大核心 2012年第12期33-37,共5页 Electroplating & Finishing
关键词 印制线路板 盲孔 填孔 电镀 设备 工艺条件 printed circuit board blind via filling electroplating equipment process parameter
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参考文献8

  • 1白蓉生.填充微盲孔之电镀铜[M】//电路板湿制程全住[出版地不详】:台湾电路板协会,2005:373-379.
  • 2IEFEBVRE M, ALLARDYCE G, SEITA M, et al. Copper electroplating technology for microvia filling [J]. Circuit World, 2003, 29 (2): 9-14.
  • 3BARTHELMES J. Acid copper plating with insoluble anode--A novel technology in PCB manufacturing [C] // Proceedings of the Electronics Circuits World Convention 8. Tokyo: [s.n.], 1999.
  • 4叶成镜 蓝国兴.电镀铜填孔技术之探讨[J].电路板会刊,2003,1(19):52-63.
  • 5崔正丹,谢添华,李志东.不同电镀参数组合对电镀填孔效果影响研究[J].印制电路信息,2011,19(4):80-84. 被引量:10
  • 6刘兰,刘湘龙,李志东.CO_2激光盲孔侧蚀现象研究[J].印制电路信息,2009,0(S1):147-151. 被引量:5
  • 7曹立志,陶伟良,黄伟.激光盲孔孔型对盲孔镀平结果的影响[C]//2007年上海市电子电镀学术年会论文集.2007:99-103.
  • 8曾曙,张伯兴.电镀填孔工艺影响因素之探讨[J].印制电路信息,2005,13(9):33-36. 被引量:13

二级参考文献12

  • 1王洪,杨宏强.微孔电镀填孔技术在IC载板中的应用[J].印制电路信息,2005,13(2):32-36. 被引量:9
  • 2陈壹华.CO_2激光成孔技术在HDI的应用研究[J].应用激光,2007,27(2):144-147. 被引量:7
  • 3J.P. Healy and D. Pletcher. The Chemistry of Additive inan Acid Copper Electroplating Bath Part 2. The Instability of 4,5-dithioctane-1,8-disluphonic acid in the both on Circuit, J[M]. Electroanal.Chem., 338,167-177,1992.
  • 4P.C. Andricacos, C.Uzoh, J.O. Dukvic, J. Horkans,Damascene Copper Electroplating for Chip Interconnections, IBM J. Res. Develop.42, 567-572,1998.
  • 5.高密度印刷电路板技术[Z].台湾电路板协会,..
  • 6Hideki Tsuchida, Masaru Kusaka Copper.Electroplating Technology for Microvia Filling. Circuitree.2004.3.
  • 7林定皓.电子构装载板技术[Z].台湾电路板协会,..
  • 8Cheng-Ching Yeh. Micro via filling plating technology for IC substrate application. Circuit World,2004.3.
  • 9Wei-Ping Dow, Hsiang-Hao Chen. A novel copper electroplating formula for laser-drilled micro via and through hole filling. Circuit World,2004.3.
  • 10Mark Lefebve, George Allardyce. Copper electroplating technology for microvia filling. Circuit World,2003.2.

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