摘要
本文综述了集成电路制造中的关键技术—光刻的传统及现代的主流技术。从超微细图形刻印的特征尺寸发展路线图,阐述了不同特征尺寸应采用的光刻曝光波长,以及不同曝光波长下应采用的石英玻璃光掩膜基板材料。
This paper introduces the key technologies in the manufacture of integrated circuits-the traditional and the modern mainstream lithography technology.From ultra-fine graphic engraving development roadmap of feature sizes,the paper elaborated lithography exposure wavelength used in different feature sizes as well as the quartz glass photomask substrate material.used in different exposure wavelength.
出处
《中国建材科技》
2012年第5期56-58,共3页
China Building Materials Science & Technology
关键词
光刻
光掩膜板
石英玻璃
Lithography
Photomasks
Quartz glass
