摘要
针对光刻系统分辨力和焦深的矛盾 ,详细研究了二元光栅照明对硅片上光强以及对光刻系统传输频率的影响 .结果表明 ,二元光栅照明可显著提高光强的对比度 ,改善成象系统的频率传递函数 ,是一种比较理想的离轴照明技术。
In view of the contradiction between the resolution and focal depth of the photolithographic system,the influence of binary grating illumination on light intensity of the wafer and transmission frequency of the photolithographic system are studied in detail.The results show that the contrast of light intensity and the frequency transfer function of the imaging system can be obviously improved by binary grating illumination.It is an ideal off axis illumination technique.
出处
《光电工程》
CAS
CSCD
2000年第3期1-3,共3页
Opto-Electronic Engineering
基金
国家自然科学基金资助项目! ( 698760 41)
关键词
光刻系统
二元光栅照明
成象特性
Photolithographic systems
Binary grating illumination
Imaging characteristics
Luminous intersity
Transfer functions
