摘要
微型光造型法的一个很大的缺点是构造物的制造时间长。为了解决这一问题 ,在报告微型光固化立体成型法现状的基础上 ,提出了一种新颖的平面曝光型光造型方案 ,设计并制作了实验装置 ,利用热敏色带制作微型平面掩膜 ,进行了平面固化成型实验。实验结果表明 ,利用平面曝光型光造型方案进行成型 ,单层硬化时间可缩短至 1 2 0
A great disadvantage of micro photograph curing stereolithography is that the prototyping time is long. To solve this problem, on the basis of informing existing actuality of micro photograph curing stereolithography, this paper suggests a new stereolithography project of planar exposure; also, the experimental device is designed and made. Thermal printing thin film is used to make micro planar mask at the same time, the planar curing experiments are carried out. Experimental results indicate that monolayer prototyping time can be cut down to 120 seconds by using the planar exposure stereolithography device.
出处
《西安理工大学学报》
CAS
2000年第1期65-68,共4页
Journal of Xi'an University of Technology
关键词
平面曝光
立体光成型法
光造型装置
微型机器
planar exposure
photograph curing stereolithography
photocurable resin
thermal printing thin film
