摘要
为了研究多层膜的腐蚀性能,促进多层膜在生产中的应用,采用电弧离子镀技术,通过调整环境N2和Ar气的时间比例在铜衬底上成功制备了不同调制周期的Ti/TiN多层膜.利用x-射线衍射谱和交流阻抗谱研究了该多层膜的结构和腐蚀性能.表面形貌显示,沉积的Ti/TiN多层膜具有明显的周期性,环境中N2和Ar气的时间比例决定了多层膜的调制周期,N2气时间越长,多层膜中TiN相层越厚.腐蚀性能测定表明,多层膜的调制周期影响其耐蚀性,当调制周期为550 nm时,沉积膜的耐腐蚀性最好.
In order to study the corrosion resistance of multilayer films and promote their appncauon in practical production, Ti/TiN mnltilayer films with various modulation periods were successfully prepared on copper substrate through adopting the arc ion plating technology and adjusting the time proportion of N2 and Ar gases. The sturcture and corrosion resistance of the proposed multilayer films were studied with x-ray diffraction spectra and alternating current （AC） impedance spectra. The observation on surface morphology shows that the deposited Ti/TiN multilayer films exhibit the apparent periodicity, and the modulation period of the multilayer films depends on the time proportion of N2 and Ar gases. The longer the aerating time of N2 gas is, the thicker the TiN layer in the multilayer films is. The experimental results of corrosion resistance indicate that the modulation period of the multilayer films will affect the corrosion resistance. When the modulation period is 550 nm, the corrosion resistance of the deposited multilayer film is the best.
出处
《沈阳工业大学学报》
EI
CAS
北大核心
2012年第4期391-396,共6页
Journal of Shenyang University of Technology
基金
辽宁省科技厅博士科研启动基金资助项目(20041022)
辽宁省教育厅科研项目(20092464)
关键词
Ti/TiN多层膜
电弧离子镀
调制周期
择优取向
XRD谱
结合强度
腐蚀性能
硬质防护膜
Ti/TiN multilayer film
arc ion plating
modulation period
preferred orientation
XRD spectrum
bonding strength
corrosion resistance
hard protective film
