摘要
本文简要阐述了"逐层"设计方法,并将其用于真空紫外波段高反膜的设计。利用Matlab软件编程设计,计算了50 nm^200 nm波段范围内高反膜系及其反射率。并与同样以熔融石英为基底、不同膜材组合所达到的膜系反射率进行了对比,反射率增大明显。同时计算了实验中出现膜厚误差时对反射率造成的影响。
This paper gives a brief description to ＂layer-by-layer＂method and applies it to the design of high-reflectance vacuum ultraviolet stack.The reflectance of the stack in the range of 50nm^200nm was calculated with Matlab software.The comparison with the other work shows that the reflectance of designed stack is significantly higher.The influence of film thickness error on reflectance was also analyzed.
出处
《真空》
CAS
2012年第4期32-35,共4页
Vacuum
关键词
真空紫外
高反膜
Rh-Si膜系
逐层设计
vaccum ultraviolet
high-reflectance stack
Rh-Si stack
layer-by-layer method
