期刊文献+

PCB通孔镀铜添加剂 被引量:4

A new type of plated through holes additives
在线阅读 下载PDF
导出
摘要 高厚径比小孔通孔电镀是PCB电镀铜的重要环节。文章将介绍一种在普通高酸低铜电镀液中加入一种吡咯与咪唑的含氮杂环聚合物的通孔电镀铜添加剂,经过通孔电镀和CVS实验结果,证明该电镀液对厚度与孔径比达到10:1的小孔(Φ=0.25 mm)的通孔电镀能力达到百分之八十五以上,具有很好的实用价值。 High Aspect Ratio through-hole plating is one of the important PCB process. This article introduces an ordinary high acid and low copper electroplating solution in a pyrrole and imidazole nitrogencontaining heterocyclic polymer through-hole plating copper additives. After a through-hole plating and CVS experiment, the results prove that the plating solution can improve the capacity more than 85% on the thickness and the aperture ratio of 10:1 holes (f= 0.25mm), which has practical value.
作者 谢金平
出处 《印制电路信息》 2012年第7期21-24,共4页 Printed Circuit Information
关键词 通孔 高厚径比 微切片 伏安曲线 Through Hole High thickness to diameter ratio micro-slice Voltammetric curves
  • 相关文献

参考文献16

  • 1李颖.中国印制电路工业现状[EB/OL].PCB世界网,2007-05-31.
  • 2朱凤鹃,李宁,黎德育.印制电路板电镀铜添加剂的研究进展[J].电镀与精饰,2008,30(8):16-20. 被引量:5
  • 3刘烈炜,郭沨,田炜,赵志祥.酸性镀铜添加剂及其工艺的发展回顾[J].材料保护,2001,34(11):19-20. 被引量:9
  • 4王志军,杨磊,刘海风.印制板酸性镀铜工艺[J].材料保护,2003,36(5):63-64. 被引量:7
  • 5Kondo K,Yamakaw a N,Tanaka Z,et al. Copper damascene electrodeposition and additives [J]. Journal of Electroanalytical Chemistry,2003,559:137-142.
  • 6Seita,Masaru,Tsuchida,et al. Electrolytic copper plating solution and method for controlling the same[P]. US:6881 319,2005-4-19.
  • 7Kim S K,Josell D,Moffat T P. Electrodeposition of Cu in the PEI-PEG-CI-SPS additive system [J]. Journal of the Electrochemical Society,2006,153(9):C616-C622.
  • 8The Role of SPS,MPSA,and chloride in additive systems for copper electrodeposition[J]. Journal of the Electrochemical Society,2007,154(2) :D78-D81.
  • 9Bozzini L B. DU rzo C,Mele V, et al. Electrodeposition of Cu from acidic sulphate solutions in the presence of polyethylene glycol and chloride ions[J]. J Mater Sci: Mater Electron,2006,17:915-923.
  • 10Nadya Tabakova,Ivan Pojarlieff, vera Mircheva.et al. The rold of multi-block copolymers of ethylene oxide and propylene oxide in ion transport during acid bright copper electro-deposition[J]. Macromol, syrup,2004,212:467-472.

二级参考文献23

  • 1[1]Allan C, Hamilton J. Acid Sulfate and Pyrophosphate Copper Plating[ J ]. Plating and Surface Finishing, 1995,82(8) :48
  • 2[2]Allan C. Hamilton J. Acid Sulfate and Pyrophosphate Copper Plating [ J ].Plating and Surface Finishing, 1997,84(8):47
  • 3[3]Homer J. Cyanide Copper Hating[ J]. Plating and Surface Finishing, 1999,86(11):36
  • 4[4]Pradhan N, Krishna P G, Dsa S C. Influence of Chloride Ion on Electrocrystallization of Copper[J] .Plating and Surface Finishing, 1996,83(3) :56
  • 5[5]Sunghee Y, Morton S, Ken N et al. Rotating Ring - Disk Electrode Studies of Copper Electrodeposition Effect of Chloride Ion and Organic Additives [J]. Plating and Surface Finishing, 1994,81 (12): 65
  • 6[6]Waston A. Acid Copper Electroplating Bath Containing Brightening and Leveling Additives[P]. U S Pat:4376685,1983- 03- 15
  • 7[7]Hans G. Electrodeposition of Copper from Acid Bath [ P]. U S Pat: 3770598,1972 - 01 - 21
  • 8[8]William E, Tcomas W. Acid Copper Plating and Additive Composition Therefor[ P]. U S Pat:4038161,1977 - 07 - 26
  • 9[9]Hars G, Herr R W. Electrodeposition of Copper[ P]. U S Pat:4110176,1978 - 08 - 29
  • 10[10]Yokoi M, Konishi S. Interactions of Cl - and Brightener-Components in Copper Plating from an Acid Sulphate Bath [ J ]. Metal Finishing, 1983,34 (8):434

共引文献17

同被引文献44

  • 1Ding Zhilian.PCB技术的革新与进步[J].印制电路信息,2007(9):19-23. 被引量:8
  • 2Cope B P, Harrover R E. Acid copper addition agent[P], US P: 2972572,1958-12-09.
  • 3黄令,辜敏,杨防祖.等.聚二硫二丙烷磺酸钠对铜电沉积初期行为的影响研究[C]//京津沪渝四直辖市第一届表面丁.程技术交流会论文集,重庆:第一届表面工程技术交流会,2002: 47-49.
  • 4IX)W W P, Huang H S, Yen M Y, et al. Roles of chloride ion in microvia filling by copper electroposition[J],Elect rochem Soc,2005,152(2): C77-C88.
  • 5FengZV,Li X,Gewirth A A. Inhibition due to the interaction of polyethylene glycol,chloride, andcopper in plating baths: A surface-enhanced raman study[J]. Phys Chem B, 2003,107: 9415-9423.
  • 6Kazuo K,Toshiaki M, Keiji W. Role of additives for copper damascene electrodeposition experiment a 1-study on inhibition and acceleration effects[J]. Electrochemical Society * 2004,151(4) : C250-C255.
  • 7Kondo K. Yamakaw A N, Tanaka Z, et al. Copper damascene eletrodeposition and additives[J], Journalof Electroanalytical Chemistry , 2003,559: 137-142.
  • 8SCHARIFKER B, HILLS G. Theoretical and experimental studies of multiple nucleation [J]. Electrochimica Acta, 1983, 28 (7): 879-889.
  • 9TAN M, GUYMON C, WHEELER D R, et al. The role of SPS, MPSA, and chloride in additive systems for copper electrodeposition [J]. Journal of the Electrochemical Society, 2007, 154 (2): D78-D81.
  • 10GRUJICIC D, PESIC B. Reaction and nucleation mechanisms of copper electrodeposition from ammoniacal solutions on vitreous carbon [J]. Electrochimica Acta, 2005, 50 (22): 4426-4443.

引证文献4

二级引证文献8

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部