摘要
对吸水剖面测井中沾污形成的原因进行了分析 ,提出降低示踪剂的比强度和注入“冷球”两种控制吸水剖面测井沾污的新工艺。从理论上分析了如何对沾污进行校正 ,建立了沾污校正的解释模型。实际结果表明 ,对沾污进行校正后提高了吸水剖面测井的解释精度。
Analyses the origin of contamination in injection profile logging; Puts forward a new technique to control the contamination by reducing specific strength of 131BaGTP microspherical tracer and injecting an amount of nonradioactive tracer; Discuses how to correct the contamination and sets up the injection profile interpretation model of contamination correction. Application result proves that such a correction can improve interpretation accuracy of injection profile log.
出处
《测井技术》
CAS
CSCD
北大核心
2000年第2期113-117,共5页
Well Logging Technology
关键词
吸水剖面
污染防治
示踪剂
测井解释
校正处理
water injection profile contamination control tracer interpretation model
