摘要
为研究沉积压强对非晶硅薄膜光学性能和结构的影响,通过改变沉积压强并采用射频磁控溅射制备a-S∶iH薄膜。借助椭偏仪、紫外可见分光光度计和拉曼光谱来分析薄膜的光学性能和微结构。研究发现,在较低沉积压强下薄膜的致密度得到提高,光学带隙偏小,折射率和消光系数较大,短程序和中程序得到改善,体内缺陷较少。并且椭偏拟合参数A越大,意味着薄膜的质量越好。结果表明,沉积气压确实对薄膜的微结构和光学性能具有重要影响。
In order to find out the pressure effect on the structure and optical property of a-Si∶H films,which is fabricated by radio frequency magnetron sputtering with varying deposition pressures,spectroscopic ellipsometry（SE）,ultraviolet and visible spectrophotometer and raman spectrum are adopted.It is found that a lower deposition pressure induces an increased density,a decreased optical bandgap and an enhancement in refractive index and extinction coefficient,as well as the improved short-range order and medium-range order with fewer bulk defects.It is further discovered that the larger the SE fitting parameter A,the better the quality of films.The result shows that deposition pressure has a great effect on the microstructure and optical properties of the films.
出处
《光电子技术》
CAS
北大核心
2012年第1期19-22,38,共5页
Optoelectronic Technology
基金
国家自然科学基金资助项目(60876045)
上海市基础研究重点项目(09JC1405900)
上海市重点学科建设项目(S30105)
SHU-SOEN's PV联合实验室基金(SS-E0700601)
关键词
a-S∶iH
椭偏
光学性能
拉曼散射
微结构
hydrogenated amorphous silicon
spectroscopic ellipsometry
optical properties
raman scattering
microstructure
