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The influence of divergence angle on the deposition of neutral chromium atoms using a laser standing wave

The influence of divergence angle on the deposition of neutral chromium atoms using a laser standing wave
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摘要 The characteristics of neutral chromium atoms in the standing wave field are discussed. Based on a semi-classical model, the motion equation of neutral atoms in the laser standing wave field is analyzed, and the trajectories of the atoms are obtained by simulations with the different divergence angles of the atomic beam. The simulation results show that the full width at half maximum (FWHM) of the stripe is 2.75 nm and the contrast is 38.5 : 1 when the divergence angle equals 0 mrad, the FWHM is 24.1 nm and the contrast is 6.8:1 when the divergence angle equals 0.2 mrad and the FWHMs are 58.6 and 137.8 nm, and the contrasts are 3.3 : 1 and 1.6 : i when the divergence angles equal 0.5 and 1.0 mrad, respectively. The characteristics of neutral chromium atoms in the standing wave field are discussed. Based on a semi-classical model, the motion equation of neutral atoms in the laser standing wave field is analyzed, and the trajectories of the atoms are obtained by simulations with the different divergence angles of the atomic beam. The simulation results show that the full width at half maximum (FWHM) of the stripe is 2.75 nm and the contrast is 38.5 : 1 when the divergence angle equals 0 mrad, the FWHM is 24.1 nm and the contrast is 6.8:1 when the divergence angle equals 0.2 mrad and the FWHMs are 58.6 and 137.8 nm, and the contrasts are 3.3 : 1 and 1.6 : i when the divergence angles equal 0.5 and 1.0 mrad, respectively.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第3期181-184,共4页 中国物理B(英文版)
基金 Project supported by the National Natural Science Foundation of China (Grant Nos. 11064002 and 11061011)
关键词 atom lithography laser standing wave full wave at half maximum CONTRAST atom lithography, laser standing wave, full wave at half maximum, contrast
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