摘要
有机发光二极管(OLED)尤其是AMOLED由于其独特的性能,其可能成为下一代显示技术。目前AMOLED显示还未达到量产之前,200 mm×200 mm的研发线对于AMOLED技术工艺验证尤为重要。AMOLED对TFT曝光的要求(CD均匀性、套刻精度等)较TFT-LCD高。基于此,介绍了可用于OLED研发要求的步进投影曝光机SS B200/10A,实测数据及显示器件成功开发表明该设备能够很好地满足AMOLED工艺要求。
It is an undoubted trend for OLED, especially AMOLED, as the next generation and potential display technology. Since producible or profitable AMOLED process has not been mastered by most display manufacturer, 200 mm x200 mm pilot line is very important and cost-efficient for process research and development. And AMOLED process require tighter CD and Overlay for TFT exposure than TFT-LCD. This paper introduces a novel type of projective stepper, SS B200/10A, for TFT procedure of AMOLED pilot line, which is totally different from proximity exposure tool called aligner. Furthermore testing data and display device show the projective stepper can meet well with requirement of AMOLED process.
出处
《电子工业专用设备》
2012年第3期12-16,53,共6页
Equipment for Electronic Products Manufacturing
