摘要
以钛酸四丁酯为原料，采用微波辅助低温法在玻璃表面制备锐钛矿结构的二氧化钛薄膜。分别用X射线衍射法（XRD）和扫描电子显微镜（SEM）表征其相结构和表面形貌；通过光催化降解实际电镀含铬废水实验，探讨了光源、废水pH、废水初始浓度、光照时间及涂膜层数对总铬去除率的影响。光催化氧化的最优条件为：废水初始浓度3000～9000mg／L，pH=8.3，负载4层薄膜，254nm紫外光照射3h。在最优条件下，废水的总铬去除率高达99．8％。
An anatase TiO2 film was prepared on glass substrate with tetrabutyl titanate as raw material through microwave assisted method at low temperature. The phase structure and surface morphology of the as-prepared film were characterized by X-ray diffraction （XRD） and scanning electron microscopy （SEM）, respectively. The effects of light source, pH, initial wastewater concentration, illumination time, and number of film layer on the removal of chromium from actual electroplating chromium-containing wastewater by photocatalytic degradation with the TiO2 film were studied. The optimal photocatalytic oxidation conditions are as follows initial concentration ofwastewater 3 000-9 000 mg/L, pH 8.3, 4-layer film coated, and illumination under ultraviolet lamp with a wavelength of 254 nm for 4 h. The total chromium removal efficiency of wastewater is up to 99.8% under the optimal conditions.
出处
《电镀与涂饰》
CAS
CSCD
北大核心
2012年第3期35-38,共4页
Electroplating & Finishing
关键词
二氧化钛
薄膜
制备
含铬废水
光催化
titanium dioxide
thin film
preparation
chromium-containing wastewater
photocatalysis
