摘要
研究了使用非平衡测控溅射技术沉积的类金刚石(DLC)薄膜其抗激光损伤能力;通过对比施加偏置电场前后薄膜的损伤情况,发现:DLC薄膜施加偏置电场后,薄膜的激光损伤区域内有大量丝状薄膜,损伤形貌存在明显不同,损伤面积减小;薄膜的激光损伤情况得到改善。实验结果显示,外加偏置电场对DLC薄膜的损伤有影响。认为:激光在DLC薄膜中激励产生的光生电子在电场的作用下产生快速漂移,间接降低了激光辐照区域内的局部能量密度,减缓了薄膜的石墨化,提高了DLC薄膜的抗激光损伤能力。
We addressed the laser irradiation damages of the diamond-like-carbon（DLC） films.The DLC films were deposited by unbalanced magnetron sputtering on substrates of p-type silicon wafer.The microstructures of the damages with and without a bias were compared.The results show that the bias significantly alleviates the laser-induced damage.For example,without a bias,the DLC films,with lots of the laser burnt pits and cracks,peeled off almost completely;in contrast,with a bias,the peeling-off was less so serious,and the laser burnt spot was smaller,where some whisker-shaped fragments existed.We suggest that the influence of the bias on laser-induced photoelectrons may possibly account for the damage reduction of laser irradiation.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2012年第1期11-14,共4页
Chinese Journal of Vacuum Science and Technology
基金
国家自然科学基金资助项目(60978040
60878032)
陕西省科技厅国际合作项目(S2010KW-69)
关键词
外加偏置电场
无氢类金刚石
激光损伤
损伤形貌
External electric field
Hydrogen-free DLC
Laser Damage
Damage morphology
