摘要
采用射频磁控溅射工艺,制备了一系列(Fe40Co40B20)1-xNix(x为原子分数)磁性薄膜,研究了样品在微波频段下的电磁性能。结果表明,通过调整Ni含量及合适的工艺参数可有效调控薄膜的微结构和电磁性能,且在(Fe40Co40B20)0.91Ni9薄膜样品中获得了优良的微波性能和高电阻率。其饱和磁化强度4πMs达到2.21T,复磁导率实部μ'在0.5～3GHz频率范围内大于195,铁磁共振频率fFMR达到3.16GHz,电阻率也达到276μΩ.cm。该薄膜可应用于GHz频段下电磁器件的设计中。
A series of（Fe40Co40B20）1-xNix magnetic thin films（x is atomic fraction） were synthesized by magnetron sputtering（RF）,and the electromagnetic and microwave properties were investigated.The results show that the microstructure and electromagnetic properties of the films can be altered by varying the content of Ni addition and suitable process parameters.Excellent microwave properties and high resistivity are achieved in the（Fe40Co40B20）0.91Ni9 thin film.The film has the saturation magnetization 4πMs of 2.21 T,the real part of complex permeability μ＇ is larger than 195 at 0.5-3.0 GHz fFMR reaches to 3.16 GHz,and the resistivity is 276 μΩ·cm.Therefore,the presented films have the potential for the electromagnetic device design in the GHz frequency range.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2011年第10期1840-1843,共4页
Rare Metal Materials and Engineering
基金
高等学校博士学科点专项科研基金(20090142110004)
关键词
磁性薄膜
微波电磁性能
复磁导率
电阻率
magnetic thin film
microwave electromagnetic
complex permeability
resistivity
