摘要
介绍了采用脉冲多弧离子源镀制镍铬铁合金膜的新技术，研究了采用这一新技术镀制镍铬铁合金膜的镀制工艺，对采用这一新技术所镀制的镍铬铁合金膜进行了性能测试。结果表明：选用合适的工艺参数，采用这一新技术镀制的镍铬铁合金膜膜层均匀，牢固度好，膜层成分与脉冲多弧离子源阴极靶材成分含量误差小于±３％ 。
In this paper, a new technique plating the nickel chrome iron alloy film by means of the pulse multi arc ion source is introduced. In research work, the plating technology of the film with this technique is obtained and the property of the film is measured. Result indicated that:the technology parameters, the technique, the uniformity and firmity of the film is appropriate. The error of the composition content between the film material and the cathode material of the pulse multi arc ion source is less than±3%. The film accords with actual demands.
出处
《光学仪器》
1999年第4期34-38,共5页
Optical Instruments
关键词
镍铬铁合金膜
薄膜沉积
离子镀
离子源
Nickel chrome iron Alloy Film, Film Deposition, Ion Plating, Uniformity, Technology Parameter, Film Property.
