期刊文献+

Fabrication of curved micro structures on photoresist layer 被引量:1

Fabrication of curved micro structures on photoresist layer
在线阅读 下载PDF
导出
摘要 A novel fabrication process for micro patterns with curvature was introduced. The curved structures were made by compensating rectangular micro structures with liquid photoresist layer. Because of the surface tension of the liquid in micro scale, various shapes of meniscus can he made on the micro channels. The micro channels were made on the silicon suhstrate in advance, and then the liquid layer was coated on the micro channels. From the nature of liquid behavior, the curved patterns with smooth surface are obtained, which cannot be made easily with the conventional mechanical machining, as well as with the microfabrication processes, such as wet and dry etching. With this principle, it is expected that the smooth and curved surfaces can be made by simple processes and the results can be applied widely, such as optical patterns. A novel fabrication process for micro patterns with curvature was introduced. The curved structures were made by compensating rectangular micro structures with liquid photoresist layer. Because of the surface tension of the liquid in micro scale, various shapes of meniscus can be made on the micro channels. The micro channels were made on the silicon substrate in advance, and then the liquid layer was coated on the micro channels. From the nature of liquid behavior, the curved patterns with smooth surface are obtained, which cannot be made easily with the conventional mechanical machining, as well as with the microfabrication processes, such as wet and dry etching. With this principle, it is expected that the smooth and curved surfaces can be made by simple processes and the results can be applied widely, such as optical patterns.
出处 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2011年第A01期100-103,共4页 中国有色金属学报(英文版)
基金 the support of Ministry of Knowledge and Economy through Strategic Technology Development Project Conversing Research Center Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology
关键词 micro pattern liquid layer MEMS micro channel silicon substrate 液态光致抗蚀剂 微结构 制备 弧形 微细加工工艺 表面光滑 微通道 液体层
  • 相关文献

参考文献10

  • 1SAHA S C,,SAGBERG H,POPPE E,JENSEN G U,FJELDLY T A,SAETHER T.Tuning of resist slope with hard-baking parameters and release methods of extra hard photoresist for RF MEMS switches. Sensors and Actuators . 2008
  • 2SHIH T K,CHEN C F,HO J R,CHUANG F T.Fabrication of various curved relief structures through concave surface forming and soft replica molding. Microelectronics Journal . 2006
  • 3KUTCHOUKOV V G,MOLLINGER J R,BOSSCHE A.New photoresist coating method for 3-D structured wafers. Sensors and Actuators . 2000
  • 4YU L,LEE Y Y,TAY F E H,ILIESCU C.Spray Coating of photoresist for 3D microstructures with different geometries. J Physics: Conference Series . 2006
  • 5Shom S. Ponoth Navnit T. Agarwal Peter D. Persans and Joel L. Plawsky.Fabrication of micromirrors with self-aligned metallization using silicon back-end-of-the-line processes. Thin Solid films . 2005
  • 6Jin-Wan Jeon,Jun-Bo Yoon,Koeng Su Lira.Sloping profile and pattern transfer to silicon by shape-controllable 3-D lithography and ICP. Sensors and Actuators . 2007
  • 7W. W. Flack,W. P. Fan,S. White.The Optimization and Characterization of Ultra-thick Photoresist Films. Advances in Resist Technology and Processing XV . 1998
  • 8Bogdanov L A,Peredkov S S.Used of SU-8photoresist for very high aspect ratio x-ray lithography. Microelectronics Engineering . 2000
  • 9Teng-Kai Shih,Chia-Fu Chen,Jeng-Rong Ho.Fabrication of PDMS(polydimethylsiloxane)microlens anddiffuser using replica molding. Microelectronics Journal . 2006
  • 10Joo B Y,Oh S I,Son Y K.Forming of micro channels with ultra thin metal foils. CIRP Ann Manuf Technol . 2004

同被引文献3

引证文献1

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部