摘要
对瑞红胶及Shipley胶制作光栅掩模时的有效曝光量进行了实验.结果表明瑞红胶全息曝光对应的感光效率只是单束光曝光感光效率的0.65倍,Shipley胶全息曝光对应的感光效率只是单束光曝光感光效率的0.8倍;且同种光刻胶的光栅掩模在不同空频的有效曝光量亦不同,即光刻胶的有效曝光量与感光效率及光栅掩模所在的空频有关.
This paper carried out tests on the effective exposures of Ruihong and shipley photo resists used in making the raster masking.The results showed that the photosensitive efficiency of Ruihong photoresist holographic exposure is 0.65 and of shipley 0.8 times that of single-beam exposure;the raster masking effective exposures of the same-type photoresists on different space-frequencies quite differed,i.e.,the effctive exposure of photoresist related directly to its photosensitive efficiency and the space-frequency of raster masking.
出处
《徐州建筑职业技术学院学报》
2011年第1期37-39,50,共4页
Journal of XUZHOU Institute of Architectural Technology
基金
2010年校级科研课题:光刻胶光栅掩膜槽型的控制与研究(JYA309-20)
